191-->195: H radical away from DMDMOS, DMDMOS (Si-OH) lost CH3 radical by H atom attack  (TSS)
    1.0
            20.00000000 0.00000000 0.00000000 
            0.00000000 15.00000000 0.00000000 
            0.00000000 0.00000000 15.00000000 
  Si O C H
  1 4 4 13
Direct
        0.36370508 0.49415997 0.49651166      	#	1      	Si
        0.35720470 0.56520437 0.41313661      	#	2      	O1
        0.44341375 0.49987629 0.51666106      	#	3      	O2
        0.33826271 0.39300130 0.47151750      	#	4      	O3
        0.31675110 0.51997869 0.58241616      	#	5      	O4
        0.29489464 0.58102459 0.37017588      	#	6      	C1
        0.48828923 0.45595506 0.57794832      	#	7      	C2
        0.36110092 0.34423617 0.39580382      	#	8      	C3
        0.31451633 0.60531152 0.62404357      	#	9      	C4
        0.27857484 0.52215643 0.33241177      	#	10     	H1
        0.25558732 0.59840435 0.41835889      	#	11     	H2
        0.30209992 0.63665009 0.32416135      	#	12     	H3
        0.47275674 0.38762583 0.59411492      	#	13     	H4
        0.53693145 0.45460807 0.54410571      	#	14     	H5
        0.49181227 0.49418178 0.63965736      	#	15     	H6
        0.33306687 0.28127844 0.39468908      	#	16     	H7
        0.35171606 0.38063376 0.33307259      	#	17     	H8
        0.41506922 0.32922642 0.39970653      	#	18     	H9
        0.36083764 0.61982108 0.66144565      	#	19     	H10
        0.30650056 0.65945925 0.57533115      	#	20     	H11
        0.27229886 0.60387034 0.67087990      	#	21     	H12
        0.65936211 0.66754945 0.52708394      	#	22     	H14