191-->195: H radical away from DMDMOS, DMDMOS (Si-OH) lost CH3 radical by H atom attack  (TSS)
    1.0
            20.00000000 0.00000000 0.00000000 
            0.00000000 15.00000000 0.00000000 
            0.00000000 0.00000000 15.00000000 
  Si O C H
  1 4 4 13
Direct
        0.36557164 0.49612377 0.49929369      	#	1      	Si
        0.35728008 0.56659958 0.41605929      	#	2      	O1
        0.44391846 0.49601213 0.52427774      	#	3      	O2
        0.33923094 0.39597978 0.47386754      	#	4      	O3
        0.31961843 0.52370576 0.58521584      	#	5      	O4
        0.29425789 0.58153214 0.37512555      	#	6      	C1
        0.49870566 0.45787062 0.56985686      	#	7      	C2
        0.35633978 0.34780787 0.39603972      	#	8      	C3
        0.31068474 0.60835882 0.62428999      	#	9      	C4
        0.27701538 0.52324287 0.33745127      	#	10     	H1
        0.25486843 0.59822684 0.42334965      	#	11     	H2
        0.29952348 0.63715395 0.32894515      	#	12     	H3
        0.49325534 0.38636071 0.58936220      	#	13     	H4
        0.54251250 0.46461275 0.52367836      	#	14     	H5
        0.50978643 0.49505407 0.63269714      	#	15     	H6
        0.32571962 0.28748240 0.39672732      	#	16     	H7
        0.34540255 0.38565822 0.33512303      	#	17     	H8
        0.40937491 0.32910329 0.39519292      	#	18     	H9
        0.35406235 0.62785928 0.66462264      	#	19     	H10
        0.30143709 0.66075874 0.57470598      	#	20     	H11
        0.26687046 0.60251923 0.66736203      	#	21     	H12
        0.64931615 0.62219048 0.52998948      	#	22     	H14