191-->195: H radical away from DMDMOS, DMDMOS (Si-OH) lost CH3 radical by H atom attack  (TSS)
    1.0
            20.00000000 0.00000000 0.00000000 
            0.00000000 15.00000000 0.00000000 
            0.00000000 0.00000000 15.00000000 
  Si O C H
  1 4 4 13
Direct
        0.36758691 0.49938923 0.49894617      	#	1      	Si
        0.35047485 0.56907985 0.41384733      	#	2      	O1
        0.45000906 0.49633668 0.53088478      	#	3      	O2
        0.33478470 0.40206755 0.47127074      	#	4      	O3
        0.31470740 0.52617119 0.57919978      	#	5      	O4
        0.28626473 0.58433246 0.37140183      	#	6      	C1
        0.51868001 0.45638857 0.57553178      	#	7      	C2
        0.35209722 0.35050999 0.39551859      	#	8      	C3
        0.30642332 0.60947333 0.62260224      	#	9      	C4
        0.26822894 0.52687464 0.33213875      	#	10     	H1
        0.24537586 0.60198285 0.41772430      	#	11     	H2
        0.29148683 0.64034933 0.32445821      	#	12     	H3
        0.50840636 0.38577110 0.58806872      	#	13     	H4
        0.56884454 0.45604358 0.53931192      	#	14     	H5
        0.53118397 0.48989876 0.63909345      	#	15     	H6
        0.32232329 0.28901761 0.39587027      	#	16     	H7
        0.34228023 0.38598054 0.33254509      	#	17     	H8
        0.40521919 0.33311619 0.39830887      	#	18     	H9
        0.35108840 0.62458471 0.66211750      	#	19     	H10
        0.29755260 0.66456516 0.57539971      	#	20     	H11
        0.26315848 0.60533781 0.66768232      	#	21     	H12
        0.63857542 0.59694212 0.53131105      	#	22     	H14