191-->195: H radical away from DMDMOS, DMDMOS (Si-OH) lost CH3 radical by H atom attack  (TSS)
    1.0
            20.00000000 0.00000000 0.00000000 
            0.00000000 15.00000000 0.00000000 
            0.00000000 0.00000000 15.00000000 
  Si O C H
  1 4 4 13
Direct
        0.35791772 0.50164846 0.49406410      	#	1      	Si
        0.34358579 0.57053909 0.40957789      	#	2      	O1
        0.43468156 0.50814768 0.52655791      	#	3      	O2
        0.32830679 0.40166270 0.46798098      	#	4      	O3
        0.30635605 0.52658187 0.57755003      	#	5      	O4
        0.28133115 0.58663216 0.36631765      	#	6      	C1
        0.54858994 0.44409212 0.59223359      	#	7      	C2
        0.35103881 0.35003655 0.39480490      	#	8      	C3
        0.30462092 0.60965932 0.62248418      	#	9      	C4
        0.26448681 0.52820085 0.32768747      	#	10     	H1
        0.24108558 0.60414241 0.41348364      	#	11     	H2
        0.28823244 0.64260438 0.31993204      	#	12     	H3
        0.50951080 0.39584606 0.57872864      	#	13     	H4
        0.59745044 0.43840890 0.56099745      	#	14     	H5
        0.54265556 0.48954697 0.64821363      	#	15     	H6
        0.32301500 0.28703298 0.39406654      	#	16     	H7
        0.34292435 0.38458598 0.33074999      	#	17     	H8
        0.40478088 0.33515039 0.40105707      	#	18     	H9
        0.35136428 0.62073567 0.65976968      	#	19     	H10
        0.29760040 0.66579468 0.57588631      	#	20     	H11
        0.26271748 0.60809540 0.66984933      	#	21     	H12
        0.63249954 0.59506863 0.53124039      	#	22     	H14