191-->195: H radical away from DMDMOS, DMDMOS (Si-OH) lost CH3 radical by H atom attack  (TSS)
    1.0
            20.00000000 0.00000000 0.00000000 
            0.00000000 15.00000000 0.00000000 
            0.00000000 0.00000000 15.00000000 
  Si O C H
  1 4 4 13
Direct
        0.34541743 0.50598744 0.49301406      	#	1      	Si
        0.33218594 0.57554885 0.40945514      	#	2      	O1
        0.42298706 0.50675107 0.52041684      	#	3      	O2
        0.31797465 0.40488503 0.46679344      	#	4      	O3
        0.29561700 0.53104541 0.57793596      	#	5      	O4
        0.27121620 0.59192685 0.36334992      	#	6      	C1
        0.59827620 0.45808291 0.58588837      	#	7      	C2
        0.34266907 0.35369610 0.39404683      	#	8      	C3
        0.29612319 0.61418467 0.62356343      	#	9      	C4
        0.25561696 0.53299832 0.32456373      	#	10     	H1
        0.23049120 0.60934679 0.40976667      	#	11     	H2
        0.27942065 0.64779379 0.31727615      	#	12     	H3
        0.55334124 0.42361548 0.55902134      	#	13     	H4
        0.64463213 0.41508268 0.58264809      	#	14     	H5
        0.59129578 0.47827774 0.65840119      	#	15     	H6
        0.31507227 0.29043802 0.39262705      	#	16     	H7
        0.33572585 0.38897847 0.33010462      	#	17     	H8
        0.39643663 0.33966548 0.40233480      	#	18     	H9
        0.34353039 0.62303661 0.66005824      	#	19     	H10
        0.29022465 0.67061175 0.57700079      	#	20     	H11
        0.25462717 0.61389188 0.67151521      	#	21     	H12
        0.60187062 0.51836790 0.54345151      	#	22     	H14