191-->195: H radical away from DMDMOS, DMDMOS (Si-OH) lost CH3 radical by H atom attack  (TSS)
    1.0
            20.00000000 0.00000000 0.00000000 
            0.00000000 15.00000000 0.00000000 
            0.00000000 0.00000000 15.00000000 
  Si O C H
  1 4 4 13
Direct
        0.33924231 0.50945291 0.49305182      	#	1      	Si
        0.32595729 0.57895995 0.40945116      	#	2      	O1
        0.41685182 0.51024899 0.52028065      	#	3      	O2
        0.31190980 0.40827757 0.46692558      	#	4      	O3
        0.28926106 0.53442196 0.57782849      	#	5      	O4
        0.26490667 0.59499614 0.36336185      	#	6      	C1
        0.61946355 0.44721489 0.58625497      	#	7      	C2
        0.33617495 0.35720999 0.39387592      	#	8      	C3
        0.28970879 0.61746020 0.62366735      	#	9      	C4
        0.24952266 0.53594792 0.32456770      	#	10     	H1
        0.22410738 0.61213390 0.40978896      	#	11     	H2
        0.27289518 0.65092592 0.31726336      	#	12     	H3
        0.57892934 0.39946720 0.57321940      	#	13     	H4
        0.66807978 0.41508642 0.57556600      	#	14     	H5
        0.61665044 0.47102279 0.65475548      	#	15     	H6
        0.30824167 0.29419084 0.39215194      	#	16     	H7
        0.32936585 0.39285076 0.33010673      	#	17     	H8
        0.38986359 0.34259834 0.40202548      	#	18     	H9
        0.33699426 0.62611960 0.66048502      	#	19     	H10
        0.28403448 0.67399667 0.57720682      	#	20     	H11
        0.24805751 0.61723764 0.67140150      	#	21     	H12
        0.61453393 0.50439266 0.53999718      	#	22     	H14